Computational Lithography (2010)

You are here

Inside Signal Processing Newsletter Home Page

Top Reasons to Join SPS Today!

1. IEEE Signal Processing Magazine
2. Signal Processing Digital Library*
3. Inside Signal Processing Newsletter
4. SPS Resource Center
5. Career advancement & recognition
6. Discounts on conferences and publications
7. Professional networking
8. Communities for students, young professionals, and women
9. Volunteer opportunities
10. Coming soon! PDH/CEU credits
Click here to learn more.

10 years of news and resources for members of the IEEE Signal Processing Society

Computational Lithography (2010)

by Xu Ma and Gonzalo R. Arce, Wiley, 1st edition, September 2010.9780470596975.pdf

Description from the publisher:  This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches. The book starts with an introduction of optical lithography systems, electric magnetic field principles, and fundamentals of optimization; it goes on to describe algorithms for the development of optimal optical proximity correction, phaseshifting mask, offaxis illumination approaches, and their combinations. The accompanying mathematical derivations and MATLAB software files make it easy for researchers, scientists, engineers, and graduate students and faculty to apply any of the optimization algorithms.

Please visit the book’s website for table of contents and more information.

Table of Contents:

SPS on Twitter

SPS Videos


Signal Processing in Home Assistants

 


Multimedia Forensics


Careers in Signal Processing             

 


Under the Radar